The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 20, 2013

Filed:

Sep. 12, 2008
Applicants:

Kun LI, Cupertino, CA (US);

Jim Waite, Los Gatos, CA (US);

Ruwan Welaratna, San Francisco, CA (US);

Johan Overby, Milpitas, CA (US);

Paolo Salvagione, San Francisco, CA (US);

Inventors:

Kun Li, Cupertino, CA (US);

Jim Waite, Los Gatos, CA (US);

Ruwan Welaratna, San Francisco, CA (US);

Johan Overby, Milpitas, CA (US);

Paolo Salvagione, San Francisco, CA (US);

Assignee:

Metrotech Corporation Inc., Santa Clara, CA (US);

Attorney:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 5/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for determining the location of underground cables and pipes is disclosed. In some embodiments, the method includes measuring a set of electromagnetic field magnitudes and phases at a plurality of positions while traversing a target line parallelly using 3D electromagnetic coil sensors, the 3D electromagnetic coil sensors being orthogonally oriented to the target line, modeling a set of expected complex electromagnetic field magnitudes of a single underground conductor at each of the positions to form a set of values corresponding to a set of individual models for the target line, determining which of the set of individuals models is a best model, determining confidence information at each of the positions based on a comparison between the measured set of complex electromagnetic magnitudes and phases and the best model, and determining parameters at each of positions related to the target line from the best model.


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