The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2013
Filed:
Nov. 19, 2010
Sabrina R. Cromer, Yonkers, NY (US);
Regina Nelson Eng, Pike Road, AL (US);
Kenrick M. Lewis, Flushing, NY (US);
Abellard T. Mereigh, Mount Vernon, NY (US);
Chi-lin O'young, Poughkeepsie, NY (US);
Hua Yu, Scarsdale, NY (US);
Sabrina R. Cromer, Yonkers, NY (US);
Regina Nelson Eng, Pike Road, AL (US);
Kenrick M. Lewis, Flushing, NY (US);
Abellard T. Mereigh, Mount Vernon, NY (US);
Chi-Lin O'Young, Poughkeepsie, NY (US);
Hua Yu, Scarsdale, NY (US);
Momentive Performance Materials, Inc., Waterford, NY (US);
Abstract
The present invention provides a process for using nanosized copper, nanosized copper oxides, nanosized copper chlorides, other nanosized copper salts, and mixtures thereof, as sources of catalytic copper in the Direct Synthesis of trialkoxysilanes of the formula HSi(OR)wherein R is an alkyl group containing from 1 to 6 carbon atoms inclusive. The nanosized copper, nanosized copper oxides, nanosized copper chlorides, other nanosized copper salts, and their mixtures of this invention have average particle sizes that are in the range from about 0.1 to about 60 nanometers, preferably from about 0.1 to about 30 nanometers, and most preferably from about 0.1 to about 15 nanometers. Nanosized sources of catalytic copper afford high dispersion of catalytic sites on silicon and contribute to high reaction rates, high selectivity and high silicon conversion. The nanosized copper catalyst precursors of the invention permit the use of substantially reduced levels of copper compared to conventional practice.