The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2013
Filed:
May. 08, 2009
Applicants:
Garry Dale Hinch, Salem, OR (US);
Sterling Chaffins, Albany, OR (US);
Kevin P. Dekam, Albany, OR (US);
Inventors:
Garry Dale Hinch, Salem, OR (US);
Sterling Chaffins, Albany, OR (US);
Kevin P. DeKam, Albany, OR (US);
Assignee:
Hewlett-Packard Development Company, L.P., Houston, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/004 (2006.01);
U.S. Cl.
CPC ...
Abstract
In some embodiments, without limitation, a hydrophobic photoresist material and a method of making the photoresist material are provided. The photoresist material is derived by creating a high resolution insoluble, or more soluble, polymer structure as a result of a controlled chemical reaction with a functionalized perfluoropolyether. Also provided are methods of coating an inkjet printhead surface and processing the coated inkjet printhead surface.