The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2013
Filed:
May. 12, 2010
Toshiyuki Shimizu, Shiga, JP;
Toshifumi Unrinin, Shiga, JP;
Toshiyuki Shimizu, Shiga, JP;
Toshifumi Unrinin, Shiga, JP;
Toyo Boseki Kabushiki Kaisha, Osaka, JP;
Abstract
Provided is a polylactic acid resin composition useful as a molding material and a packaging material. The polylactic acid resin composition comprises a resin composition (l) comprising poly-L-lactic acid having an L-isomer content of 90-100 mol % as the main component and a resin composition (d) comprising poly-D-lactic acid having a D-isomer content of 90-100 mol % as the main component, the resin compositions (l) and (d) having been alternately stacked so that each layer has a thickness of 0.01-2.5 μm. The polylactic acid resin composition has specific thermal properties, can be used at high temperatures even after high-temperature melt molding, and can give molded polylactic acid articles having excellent suitability for various kinds of processing, such as printing, and having excellent transparency, etc. Also provided is a stretched polylactic acid resin film obtained by heating the polylactic acid resin composition to 280° C. or higher, subsequently cooling the composition, thereafter forming the polylactic acid resin composition into a film, and then stretching the film in at least one direction. This film can be used at high temperatures and has excellent suitability for various kinds of processing, excellent transparency, etc.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile