The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2013
Filed:
Sep. 19, 2011
Christian Rene′ Bonhote, San Jose, CA (US);
Jeffrey S. Lille, Sunnyvale, CA (US);
Ricardo Ruiz, Santa Clara, CA (US);
Georges Gibran Siddiqi, San Jose, CA (US);
Christian Rene′ Bonhote, San Jose, CA (US);
Jeffrey S. Lille, Sunnyvale, CA (US);
Ricardo Ruiz, Santa Clara, CA (US);
Georges Gibran Siddiqi, San Jose, CA (US);
HGST Netherlands B.V., Amsterdam, NL;
Abstract
A method for making a master disk to be used in the nanoimprinting process to make patterned-media disks uses an electrically conductive substrate and guided self-assembly of a block copolymer to form patterns of generally radial lines and/or generally concentric rings of one of the block copolymer components. A metal is electroplated onto the substrate in the regions not protected by the lines and/or rings. After removal of the block copolymer component, the remaining metal pattern is used as an etch mask to fabricate either the final master disk or two separate molds that are then used to fabricate the master disk.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile