The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 20, 2013
Filed:
Feb. 01, 2011
Benjamin Y. H. Liu, North Oaks, MN (US);
Thuc M. Dinh, Shakopee, MN (US);
Yamin MA, Roseville, MN (US);
Benjamin Y. H. Liu, North Oaks, MN (US);
Thuc M. Dinh, Shakopee, MN (US);
Yamin Ma, Roseville, MN (US);
MSP Corporation, Shoreview, MN (US);
Abstract
The present disclosure relates to an apparatus and a method for forming a droplet aerosol for vaporization and subsequent thin film deposition on a substrate. The apparatus includes a mechanism to control the rate of liquid flow through the apparatus, the mechanism including a piezoelectric actuator to adjust the rate of liquid flow and an atomizing mechanism drawing gas from a compressed gas source such that when the gas source conjoins with the liquid, the liquid is atomized to form droplets suspended in the gas thereby forming a droplet aerosol suitable for subsequent thin film deposition on a substrate. The method includes drawing a gas from a compressed gas source and drawing a liquid from a liquid source. The liquid and gas are conjoined in either a coaxial flow relationship or a radial flow relationship or an angular relationship between radial and coaxial flow wherein the gas engages the liquid to form droplets suitable for vaporization and subsequent thin film deposition on a substrate.