The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2013
Filed:
Dec. 10, 2010
Jeffrey J. Grott, Irwin, PA (US);
Jeffery J. Williams, Mckees Rocks, PA (US);
Konrad Swirski, Warsaw, PL;
Tomasz Chomiak, Warsaw, PL;
Konrad Wojdan, Warsaw, PL;
Jeffrey J. Grott, Irwin, PA (US);
Jeffery J. Williams, Mckees Rocks, PA (US);
Konrad Swirski, Warsaw, PL;
Tomasz Chomiak, Warsaw, PL;
Konrad Wojdan, Warsaw, PL;
Emerson Process Management Power & Water Solutions, Inc., Pittsburgh, PA (US);
Abstract
An integrated optimization and control technique performs process control and optimization using stochastic optimization similar to the manner in which biological immune systems work, and thus without the use of historical process models that must be created prior to placing the control and optimization routine in operation within a plant. An integrated optimization and control technique collects various indications of process control states during the on-line operation of the process, and attempts to optimize the process operation by developing a series of sets of process control inputs to be provided to the process, wherein the control inputs may be developed from the stored process control states using an objective function that defines a particular optimality criteria to be used in optimizing the operation of the process. The technique responds to a significant change in the current process state by determining anew set of process control inputs to be provided to the process based on one or more of the stored process control states.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile