The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2013
Filed:
Sep. 28, 2011
Yingjian Chen, Fremont, CA (US);
Shiwen Huang, Fremont, CA (US);
Edward Hin Pong Lee, San Jose, CA (US);
Mun Hyoun Park, San Jose, CA (US);
Kyusik Shin, Pleasanton, CA (US);
Yuming Zhou, Lakeville, MN (US);
Yingjian Chen, Fremont, CA (US);
Shiwen Huang, Fremont, CA (US);
Edward Hin Pong Lee, San Jose, CA (US);
Mun Hyoun Park, San Jose, CA (US);
Kyusik Shin, Pleasanton, CA (US);
Yuming Zhou, Lakeville, MN (US);
HGST Netherlands B.V., Amsterdam, NL;
Abstract
A write head for use in a magnetic disk drive and methods of manufacturing the same. When a non-magnetic reactive ion etching (RIE) stop layer is used in a damascene main pole fabrication process, the leading edge shield and the side shield have a magnetic separation. By replacing a non-magnetic RIE stop layer with a magnetic RIE stop layer, no removal of the RIE stop layer around the main pole is necessary. Additionally, the leading edge shield and the side shield will magnetically join together without extra processing as there will be no magnetic separation between the leading edge shield and the side shield.