The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2013
Filed:
Jun. 04, 2012
Franklin Mark Schellenberg, Palo Alto, CA (US);
Keith Edward Bennett, Palo Alto, CA (US);
Franklin Mark Schellenberg, Palo Alto, CA (US);
Keith Edward Bennett, Palo Alto, CA (US);
Other;
Abstract
A method for fabricating waveguides comprising nano-apertures for illumination of sub-resolution exposures is presented. In particular, the end of a waveguide, such as an optical fiber, is coated with a material, such as an electrically conducting metal or a semiconductor. This material is then selectively removed through the process of ion milling, creating an aperture in the material at the end of the waveguide. Under normal conditions, if the aperture is smaller than the wavelength of light in the waveguide, there is little or no transmission through the aperture. However, with the appropriate selection of materials and aperture geometry, for example a metallic conducting coating and sub-wavelength 'C-shaped' or 'bow-tie' aperture, enhancement of transmission of light through the aperture can be achieved, allowing effective illumination of sub-resolution spots using the ion-milled aperture. This can be used in a nanolithography system incorporating waveguide illuminators as well.