The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 13, 2013

Filed:

Jun. 28, 2011
Applicants:

A. David Johnson, San Leandro, CA (US);

Valery V. Martynov, San Francisco, CA (US);

Vikas Gupta, San Leandro, CA (US);

Arani Bose, New York, NY (US);

Inventors:

A. David Johnson, San Leandro, CA (US);

Valery V. Martynov, San Francisco, CA (US);

Vikas Gupta, San Leandro, CA (US);

Arani Bose, New York, NY (US);

Assignees:

Stryker Corporation, Kalamazoo, MI (US);

Stryker NV Operations Limited, Dublin, IE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/35 (2006.01);
U.S. Cl.
CPC ...
Abstract

A thin film device, such as an intravascular stent, is disclosed. The device is formed of a seamless expanse of thin-film (i) formed of a sputtered nitinol shape memory alloy, defining, in an austenitic state, an open, interior volume, having a thickness between 0 5-50 microns, having an austenite finish temperature Abelow 37° C.; and demonstrating a stress/strain recovery greater than 3% at 37° C. The expanse can be deformed into a substantially compacted configuration in a martensitic state, and assumes, in its austenitic state, a shape defining such open, interior volume. Also disclosed is a sputtering method for forming the device.


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