The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 13, 2013
Filed:
Dec. 27, 2010
Vahid S. Moshtagh, Livermore, CA (US);
Heng Liu, Livermore, CA (US);
Jeffery Ramer, Livermore, CA (US);
Michael Solomensky, Livermore, CA (US);
Vahid S. Moshtagh, Livermore, CA (US);
Heng Liu, Livermore, CA (US);
Jeffery Ramer, Livermore, CA (US);
Michael Solomensky, Livermore, CA (US);
Toshiba Techno Center Inc., Tokyo, JP;
Abstract
A cross flow chemical vapor deposition chamber can comprise an inlet duct having a generally rectangular cross-section and an outlet duct having a generally rectangular cross-section. The rectangular inlet duct and the rectangular outlet duct can facilitate laminar flow of reactant gases over a susceptor. Movable partitions can be configured to define a plurality of zones within the chamber. Each zone can contain a different reactant gas, concentration of reactant gas, and/or flow rate of reactant gas. Enhanced laminar flow can be provided, undesirable depletion of reactant gas can be mitigated, and enhanced control of reactant gases can be facilitated.