The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2013
Filed:
May. 21, 2010
Joseph R. Bietry, Rochester, NY (US);
Andrew F. Kurtz, Macedon, NY (US);
Barry D. Silverstein, Rochester, NY (US);
James Mazzarella, Fairport, NY (US);
Joseph R. Bietry, Rochester, NY (US);
Andrew F. Kurtz, Macedon, NY (US);
Barry D. Silverstein, Rochester, NY (US);
James Mazzarella, Fairport, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
A method for designing an imaging lens having reduced susceptibility to thermally-induced stress birefringence, the imaging lens having first and second groups of lens elements located either side of an aperture stop, the method comprising: defining a set of lens design attributes; defining a set of lens performance criteria including a thermally-induced stress birefringence performance criterion; defining a first set of candidate glasses having a negligible susceptibility to thermal stress birefringence and a second set of candidate glasses having at most a moderate susceptibility to thermal stress birefringence; selecting glasses for lens elements that are located adjacent to the aperture stop from the first set of candidate glasses; selecting glasses for the remaining lens elements from the first or second sets of candidate glasses; and using a computer processor to determine a lens design for the imaging lens.