The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2013
Filed:
Dec. 30, 2010
Dennis M. Fischette, Mountain View, CA (US);
Rohit Kumar, San Jose, CA (US);
Dennis M. Fischette, Mountain View, CA (US);
Rohit Kumar, San Jose, CA (US);
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Abstract
A method and mechanism for reducing lock time of a dual-path phase lock loop (PLL). The PLL comprises a dual-path low-pass filter (LPF). The LPF includes a first filter and a second filter. The first filter comprises a passive second-order lead-lag low-pass filter. The second filter comprises a first-order lag low-pass filter. During a lock-acquisition state, an impedance value within the second stage is bypassed, which increases the loop bandwidth of the PLL. In addition, a resistance within the first stage is increased in order to increase the gain of the first stage and maintain stability within the PLL. During a lock state, the impedance value may no longer be bypassed and the increased resistance may be returned to its original value.