The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2013
Filed:
Dec. 10, 2010
Kazuyoshi Tanase, Matsumoto, JP;
Toru Miyamoto, Shiojiri, JP;
Toru Takahashi, Azumino, JP;
Hirokazu Kasahara, Okaya, JP;
Kazuyoshi Tanase, Matsumoto, JP;
Toru Miyamoto, Shiojiri, JP;
Toru Takahashi, Azumino, JP;
Hirokazu Kasahara, Okaya, JP;
Seiko Epson Corporation, Tokyo, JP;
Abstract
A dither mask is used in a halftone process that is performed by the printer that includes the preceding and following heads. The dither mask includes preceding and following head storage regions. The preceding head storage region is used for a printing portion of the preceding head. The following head storage region is used for a printing portion of the following head. The dither mask is generated by determining, using comprehensive evaluation values, storage elements in which thresholds are to be stored under the condition that dots are permitted to be formed by the preceding and following heads at the same position in the region corresponding the overlapping regions.