The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 06, 2013

Filed:

Jul. 20, 2012
Applicants:

Kevin R. Coffey, Oviedo, FL (US);

VU Huynh Lam, Winter Springs, FL (US);

Edward Dein, Saint Cloud, FL (US);

Andrew P. Warren, Cocoa, FL (US);

Glenn Boreman, Geneva, FL (US);

Guy Zummo, Orlando, FL (US);

Wilson Caba, Orlando, FL (US);

Inventors:

Kevin R. Coffey, Oviedo, FL (US);

Vu Huynh Lam, Winter Springs, FL (US);

Edward Dein, Saint Cloud, FL (US);

Andrew P. Warren, Cocoa, FL (US);

Glenn Boreman, Geneva, FL (US);

Guy Zummo, Orlando, FL (US);

Wilson Caba, Orlando, FL (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01C 7/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

A resistor, fabricating method, and thermal sensor material for resistors that incorporate high Temperature Coefficient of Resistance (TCR) values and low resistivity for better sensitivity in infrared imaging applications are disclosed. Amorphous oxide thin films, preferably oxides of vanadium (VO), were deposited on thermally grown silicon dioxide by direct current (DC) magnetron co-sputtering of noble metals (gold and platinum) in a controlled argon/oxygen atmosphere. The ideal conditions for preparing an amorphous vanadium oxide/noble metal thin film are identified. TCR and resistivity results showed that the additions of gold (Au) and platinum (Pt) into VOreduced the resistivity. However, only gold (Au) was found to improve TCR value. Reducing the amount of oxygen in the thin film, further improved the ratio between TCR and resistivity. Infrared detection and imaging devices can be greatly improved with a 'drop-in' amorphous vanadium oxide/noble metal thin film of the present invention.


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