The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2013
Filed:
May. 24, 2010
Tetsuya Kanda, Tokyo, JP;
Tetsuya Kanda, Tokyo, JP;
Agilent Technologies, Inc., Santa Clara, CA (US);
Abstract
In an atmospheric inductively coupled plasma generating apparatus, impedance matching between a coil for plasma generation and an RF power source is effected at a high speed. A control method and/or condition for the output frequency of an oscillator which supplies a power to the coil for plasma generation or a control method and a control condition for the output power of the oscillator are changed appropriately in accordance with a generation state of a plasma. When a plasma is not generated, the output frequency is controlled according to a first condition and, when a plasma is generated, the output frequency is controlled according to a second condition different from the first condition. When a plasma is not generated, the output power is controlled according to a third condition and, when a plasma is generated, the output power is controlled according to a fourth condition different from the third condition.