The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 06, 2013

Filed:

Nov. 01, 2011
Applicants:

Hui Shirley Yang, Plainsboro, NJ (US);

Derek Pakenham, Hamilton, NJ (US);

Herve Adam, Clarksburg, NJ (US);

Pierre Hennaux, New York, NY (US);

Inventors:

Hui Shirley Yang, Plainsboro, NJ (US);

Derek Pakenham, Hamilton, NJ (US);

Herve Adam, Clarksburg, NJ (US);

Pierre Hennaux, New York, NY (US);

Assignee:

Rhodia Operations, Aubervilliers, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 31/02 (2006.01); C08L 33/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

A monomer compound that contains at least one polymerizable functional group per molecule, and at least one bicycloheptyl-, bicycloheptenyl-, or branched (C-C)alkyl-polyether radical per molecule, wherein the bicycloheptyl- or bicycloheptenyl-polyether radical may optionally be substituted on one or more of the ring carbon atoms by one or two (C-C)alkyl groups per ring carbon atom is useful in making polymers, particularly pH responsive polymers.


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