The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 06, 2013

Filed:

Jun. 14, 2007
Applicants:

Munaf Rahimo, Uezwil, CH;

Arnost Kopta, Zürich, CH;

Stefan Linder, Zofingen, CH;

Inventors:

Munaf Rahimo, Uezwil, CH;

Arnost Kopta, Zürich, CH;

Stefan Linder, Zofingen, CH;

Assignee:

ABB Technology AG, Zurich, CH;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/30 (2006.01); H01L 21/46 (2006.01);
U.S. Cl.
CPC ...
Abstract

In order to produce a power semiconductor for operation at high blocking voltages, there is produced on a lightly doped layer having a doping of a first charge carrier type a medium-doped layer of the same charge carrier type. A highly doped layer is produced at that side of the medium-doped layer which is remote from the lightly doped layer, of which highly doped layer a part with high doping that remains in the finished semiconductor forms a second stop layer, wherein the doping of the highly doped layer is higher than the doping of the medium-doped layer. An electrode is subsequently indiffused into the highly doped layer. The part with low doping that remains in the finished semiconductor forms the drift layer and the remaining medium-doped part forms the first stop layer.


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