The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8501026 B1

PDF
Full Text
Expired
Date of Patent:
Aug. 06, 2013

Filed:

Jun. 17, 2010
Applicants:

Christophe Constancias, Sarcenas, FR;

Bernard Dalzotto, Grenoble, FR;

Frank Fournel, Villard-Bonnot, FR;

Philippe Michallon, St Martin D'Uriage, FR;

Hubert Moriceau, Saint Egreve, FR;

Valerie Pouteau, Meylan, FR;

Inventors:

Christophe Constancias, Sarcenas, FR;

Bernard Dalzotto, Grenoble, FR;

Frank Fournel, Villard-Bonnot, FR;

Philippe Michallon, St Martin D'Uriage, FR;

Hubert Moriceau, Saint Egreve, FR;

Valerie Pouteau, Meylan, FR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01); H01L 21/31 (2006.01); G01N 3/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for determining a minimum tension compensation stress which will have a membrane of a thickness of less than or equal to one micrometer, secured to a frame, having, in the absence of any external stress, a desired deflection. The membrane can be made as planar as possible in absence of any external stress, and its thickness can be less than or equal to one micrometer.


Find Patent Forward Citations

Quick Actions:

Constancias, Christophe. (2013). Method for making a planar membrane (U.S. Patent No. 8501026). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8501026

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…