The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2013
Filed:
Nov. 02, 2011
Thomas R. Albrecht, San Jose, CA (US);
Elizabeth Ann Dobisz, San Jose, CA (US);
Guoliang Liu, Madison, WI (US);
Ricardo Ruiz, Santa Clara, CA (US);
Gabriel Zeltzer, Mountain View, CA (US);
Thomas R. Albrecht, San Jose, CA (US);
Elizabeth Ann Dobisz, San Jose, CA (US);
Guoliang Liu, Madison, WI (US);
Ricardo Ruiz, Santa Clara, CA (US);
Gabriel Zeltzer, Mountain View, CA (US);
HGST Netherlands B.V., Amsterdam, NL;
Abstract
A method for making a master disk for nanoimprinting patterned-media magnetic recording disks has patterns for both the data islands and the nondata regions. The method uses guided self-assembly of a block copolymer (BCP) to form patterns of generally radial lines and/or generally concentric rings as well as patterns of gap regions of one of the BCP components. The pattern of lines and/or rings have the BCP components aligned as lamellae perpendicular to the substrate, while the pattern of gap regions has the BCP components aligned as lamellae parallel to the substrate. One of the BCP components is removed, leaving the other BCP component as an etch mask to fabricate either the final master disk or two separate molds that are then used to fabricate the master disk.