The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 06, 2013
Filed:
Aug. 03, 2011
Applicant:
Tetsuya Karaki, Kawasaki, JP;
Inventor:
Tetsuya Karaki, Kawasaki, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Provided is a film formation mask capable of preventing slit-like openings from being closed by vibrations so as to form a highly precise patterned film with stability. In a film formation mask formed by providing multiple slit-like openings in a metal foil, the shape of the opening of at least one end of the slit-like openings is asymmetrical with respect to a center line of the width direction of the slit-like openings.