The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 30, 2013

Filed:

Feb. 24, 2012
Applicants:

Azadeh Ahadian, San Jose, CA (US);

Stephen A. Brodsky, Los Gatos, CA (US);

Michael G. Burke, Yonkers, NY (US);

Zeus Courtois, Laredo, TX (US);

Tony K. Leung, San Jose, CA (US);

Rebecca B. Nin, Morgan Hill, CA (US);

Igor Peshansky, Emerson, NJ (US);

Sonali Surange, San Rafael, CA (US);

Inventors:

Azadeh Ahadian, San Jose, CA (US);

Stephen A. Brodsky, Los Gatos, CA (US);

Michael G. Burke, Yonkers, NY (US);

Zeus Courtois, Laredo, TX (US);

Tony K. Leung, San Jose, CA (US);

Rebecca B. Nin, Morgan Hill, CA (US);

Igor Peshansky, Emerson, NJ (US);

Sonali Surange, San Rafael, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 9/44 (2006.01); G06F 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A technique is disclosed for identifying impact of database changes on an application. Given a proposed database change, affected source code is identified that is affected by the proposed database change. References to the affected source code are created and organized into a hierarchy. A user can ascertain the extent of the impact by viewing the hierarchy and by using the hierarchy to access and view the affected source code in a visually distinct manner.


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