The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8496757 B1

PDF
Full Text
Expired
Date of Patent:
Jul. 30, 2013

Filed:

Jul. 22, 2012
Applicant:

Mark Jonathan Beck, Los Gatos, CA (US);

Inventor:

Mark Jonathan Beck, Los Gatos, CA (US);

Assignee:

Fontana Technology, Campbell, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C11D 3/37 (2006.01);
U.S. Cl.
CPC ...
Abstract

A cleaning solution and method for removing submicron particles from the surface and/or the bevel of an electronic substrate such as a semiconductor wafer. The cleaning solution comprises a polycarboxylate polymer or an ethoxylated polyamine. The method comprises the step of contacting a surface of the substrate with a cleaning solution comprised of a polycarboxylate polymer or an ethoxylated polyamine. Additional optional steps in the method include applying acoustic energy to the cleaning solution and/or rinsing the surface with a rinsing solution with or without the application of acoustic energy to the rinsing solution.


Find Patent Forward Citations

Beck, Mark. (2013). Method for cleaning wafers using a polycarboxylate solution (U.S. Patent No. 8496757). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8496757

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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