The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 23, 2013

Filed:

Apr. 20, 2011
Applicants:

Samer Banna, San Jose, CA (US);

Valentin N. Todorow, Palo Alto, CA (US);

Tse-chiang Wang, Concord, CA (US);

Xing Lin, San Jose, CA (US);

Inventors:

Samer Banna, San Jose, CA (US);

Valentin N. Todorow, Palo Alto, CA (US);

Tse-Chiang Wang, Concord, CA (US);

Xing Lin, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H05B 31/26 (2006.01);
U.S. Cl.
CPC ...
Abstract

Methods for calibrating RF power applied to a plurality of RF coils are provided. In some embodiments, a method of calibrating RF power applied to a first and second RF coil of a process chamber having a power divider to control a first ratio equal to a first magnitude of RF power provided to the first RF coil divided by a second magnitude of RF power provided to the second RF coil, may include measuring a plurality of first ratios over a range of setpoint values of the power divider, comparing the plurality of measured first ratios to a plurality of reference first ratios, and adjusting an actual value of the power divider at a given setpoint value such that the first ratio of the power divider at the given setpoint matches the corresponding reference first ratio to within a first tolerance level.


Find Patent Forward Citations

Banna, Samer. (2013). Methods for calibrating rf power applied to a plurality of rf coils in a plasma processing system (U.S. Patent No. 8492980). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8492980

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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