The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2013
Filed:
Mar. 28, 2012
Applicant:
Seiichi Izawa, Minamiashigara, JP;
Inventor:
Seiichi Izawa, Minamiashigara, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G11B 9/10 (2006.01);
U.S. Cl.
CPC ...
Abstract
When applying an electron beam to a master substrate of disk-shaped recording medium placed on a rotation stage, while rotating the master substrate by rotating the rotation stage, to write a master pattern of disk-shaped recording medium on the master substrate, causing the writing to be suspended based on abnormality information of environment and storing a rotation angle of the master substrate when the writing is suspended and causing, thereafter, the writing to be resumed from a suspended position of the writing on the master substrate based on the rotation angle.