The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 16, 2013

Filed:

Dec. 23, 2010
Applicants:

Nabil Rizkalla, Rivervale, NJ (US);

Norma B. Castagnola, East Windsor, NJ (US);

Girish Desai, East Brunswick, NJ (US);

Inventors:

Nabil Rizkalla, Rivervale, NJ (US);

Norma B. Castagnola, East Windsor, NJ (US);

Girish Desai, East Brunswick, NJ (US);

Assignee:

Scientific Design Company, Inc., Little Ferry, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07D 301/03 (2006.01);
U.S. Cl.
CPC ...
Abstract

A start-up process for epoxidation of ethylene is provided. The process includes initiating an epoxidation reaction by reacting a feed gas composition in the presence of an epoxidation catalyst at a first temperature of about 180° C. to about 210° C. The first temperature is increased to a second temperature of about 230° C. to about 290° C., over a time period of about 6 hours to about 50 hours, while simultaneously adding a sufficient concentration of moderator so that the amount of moderator adsorbed on the catalyst after achieving the second temperature is from about 10 to about 50 g/mof catalyst. The second temperature is maintained for about 50 hours to about 350 hours, while regulating the feed gas composition to contain about 0.5% to about 25% CO. The second temperature is decreased to a third temperature, while simultaneously increasing moderator concentration to a level greater than the sufficient concentration.


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