The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2013
Filed:
Feb. 29, 2008
Herve Genesle, Ludwigshafen, DE;
Thorsten Oost, Biberach an der Riss, DE;
Charles W. Hutchins, Green Oaks, IL (US);
Liliane Unger, Ludwigshafen, DE;
Wilfried Hornberger, Ludwigshafen, DE;
Wilfried Lubisch, Heidelberg, DE;
Astrid Netz, Ludwigshafen, DE;
Alfred Hahn, Mannheim, DE;
Herve Genesle, Ludwigshafen, DE;
Thorsten Oost, Biberach an der Riss, DE;
Charles W. Hutchins, Green Oaks, IL (US);
Liliane Unger, Ludwigshafen, DE;
Wilfried Hornberger, Ludwigshafen, DE;
Wilfried Lubisch, Heidelberg, DE;
Astrid Netz, Ludwigshafen, DE;
Wolfgang Wernet, Ludwigshafen, DE;
Abbott GmbH & Co. KG, Wiesbaden, DE;
Abstract
The present invention relates to compounds of the general formula (I) in which A, B, R, Rand Het have the meaning given in claim in which D is C-C-alkylene, where D may have a substituent R; Ris hydrogen, C-C-alkyl or together with Ris C-C-alkylene which may have a radical R, or together with Ris C-C-alkylene, and Ris hydrogen, C-C-alkyl or together with Ris C-C-alkylene which may have a radical R, or together with Ris C-C-alkylene, where Rtogether with R, where present, are a bond or C-C-alkylene; and where one of the following conditions is satisfied: Rtogether with Ris C-C-alkylene which may have a radical R; or Rtogether with Ris C-C-alkylene; or Rtogether with Ris C-C-alkylene where the radical A is different from phenyl when the radical B is phenyl or naphthyl;