The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2013
Filed:
Nov. 14, 2011
Dong-min Kang, Seoul, KR;
Dongchan Bae, Suwon-si, KR;
Kyoochul Cho, Yongin-si, KR;
Baiksoon Choi, Anyang-si, KR;
Seunghyun Ahn, Suwon-si, KR;
Myungkook Park, Siheung-si, KR;
Goun Kim, Suwon-si, KR;
Dong-Min Kang, Seoul, KR;
Dongchan Bae, Suwon-si, KR;
Kyoochul Cho, Yongin-si, KR;
Baiksoon Choi, Anyang-si, KR;
Seunghyun Ahn, Suwon-si, KR;
Myungkook Park, Siheung-si, KR;
Goun Kim, Suwon-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Cheil Industries Inc., Gumi-si, KR;
Abstract
Provided are a composition for removing a photoresist and a method of manufacturing a semiconductor device using the composition. The composition includes about 60-90 wt % of dimethyl sulfoxide, about 10-30 wt % of a polar organic solvent, about 0.5-1.5 wt % of hydroxy alkyl ammonium and about 1-10 wt % of an amine containing no hydroxyl group.