The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2013
Filed:
Feb. 02, 2010
Hyeong Ho Park, Daejeon, KR;
Jun Ho Jeong, Daejeon, KR;
Ki Don Kim, Seoul, KR;
Dae Geun Choi, Daejeon, KR;
Jun Hyuk Choi, Daejeon, KR;
Ji Hye Lee, Daejeon, KR;
Soon Won Lee, Daejeon, KR;
Hyeong Ho Park, Daejeon, KR;
Jun Ho Jeong, Daejeon, KR;
Ki Don Kim, Seoul, KR;
Dae Geun Choi, Daejeon, KR;
Jun Hyuk Choi, Daejeon, KR;
Ji Hye Lee, Daejeon, KR;
Soon Won Lee, Daejeon, KR;
Korea Institute of Machinery and Materials, Daejeon, KR;
Abstract
Disclosed are a patterning method of a metal oxide thin film using nanoimprinting, and a manufacturing method of a light emitting diode (LED). The method for forming a metal oxide thin film pattern using nanoimprinting includes: coating a photosensitive metal-organic material precursor solution on a substrate; preparing a mold patterned to have a protrusion and depression structure; pressurizing the photosensitive metal-organic material precursor coating layer with the patterned mold; forming a cured metal oxide thin film pattern by heating the pressurized photosensitive metal-organic material precursor coating layer or by irradiating ultraviolet rays to the pressurized photosensitive metal-organic material precursor coating layer while being heated; and removing the patterned mold from the metal oxide thin film pattern, and selectively further includes annealing the metal oxide thin film pattern. Within this, there is provided a method for forming a metal dioxe thin film pattern using nano imprinting, which makes it possible to simplify the process for forming the pattern since the process of separately applying the ultraviolet resin to be used as the resist can be omitted, and forms a micro/nano composite pattern through a single imprint process.