The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2013
Filed:
Feb. 26, 2010
Heung-yeol NA, Yongin, KR;
Ki-yong Lee, Yongin, KR;
Min-jae Jeong, Yongin, KR;
Jong-won Hong, Yongin, KR;
Yun-mo Chung, Yongin, KR;
Eu-gene Kang, Yongin, KR;
Seok-rak Chang, Yongin, KR;
Jin-wook Seo, Yongin, KR;
Ji-su Ahn, Yongin, KR;
Tae-hoon Yang, Yongin, KR;
Young-dae Kim, Yongin, KR;
Byoung-keon Park, Yongin, KR;
Dong-hyun Lee, Yongin, KR;
Kil-won Lee, Yongin, KR;
Jae-wan Jung, Yongin, KR;
Jong-ryuk Park, Yongin, KR;
Bo-kyung Choi, Yongin, KR;
Sang-hyun Yun, Yongin, KR;
Heung-Yeol Na, Yongin, KR;
Ki-Yong Lee, Yongin, KR;
Min-Jae Jeong, Yongin, KR;
Jong-Won Hong, Yongin, KR;
Yun-Mo Chung, Yongin, KR;
Eu-Gene Kang, Yongin, KR;
Seok-Rak Chang, Yongin, KR;
Jin-Wook Seo, Yongin, KR;
Ji-Su Ahn, Yongin, KR;
Tae-Hoon Yang, Yongin, KR;
Young-Dae Kim, Yongin, KR;
Byoung-Keon Park, Yongin, KR;
Dong-Hyun Lee, Yongin, KR;
Kil-Won Lee, Yongin, KR;
Jae-Wan Jung, Yongin, KR;
Jong-Ryuk Park, Yongin, KR;
Bo-Kyung Choi, Yongin, KR;
Sang-Hyun Yun, Yongin, KR;
Samsung Display Co., Ltd., Yongin, KR;
Abstract
An atomic layer deposition apparatus includes a chamber, a vacuum pump to control a pressure in the chamber, a gas supply unit to supply a reaction gas into the chamber, a substrate holder disposed between the vacuum pump and the gas supply unit and having a heater, a mask assembly disposed between the substrate holder and the gas supply unit and having a cooling path to move coolant, and a coolant source to supply the coolant into the cooling path. The mask assembly is positioned a first distance from a substrate, and coolant is supplied into the cooling path of the mask assembly. The substrate is heated using the heater of the substrate holder, a pressure of the chamber is controlled using the vacuum pump, and reaction gasses are sequentially supplied through the gas supply unit.