The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 16, 2013
Filed:
Apr. 07, 2009
Ravinder Aggarwal, Gilbert, AZ (US);
Rand Conner, Chandler, DE (US);
John Disanto, Scottsdale, AZ (US);
James A. Alexander, Tempe, AZ (US);
Ravinder Aggarwal, Gilbert, AZ (US);
Rand Conner, Chandler, DE (US);
John Disanto, Scottsdale, AZ (US);
James A. Alexander, Tempe, AZ (US);
ASM America, Inc., Phoenix, AZ (US);
Abstract
Methods and apparatuses for separately injecting gases into a reactor for a substrate processing system. The flow profiles of the gases are controlled with two or more sets of adjustable gas flow injectors. The methods are particularly useful for selective deposition of gases in a CVD system using volatile combinations of precursors and etchants. In either case, the gases are provided along separate flow paths that intersect in a relatively open reaction space, rather than in more confined upstream locations.