The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2013
Filed:
Oct. 16, 2008
Jean-michel Pouvesle, Saint Pryve Saint Mesmin, FR;
Christophe Cachoncinlle, Tigy, FR;
Raymond Viladrosa, Darvoy, FR;
Ahmed Khacef, Orleans, FR;
Eric Robert, Orleans, FR;
Sébastien Dozias, Orleans, FR;
Jean-Michel Pouvesle, Saint Pryve Saint Mesmin, FR;
Christophe Cachoncinlle, Tigy, FR;
Raymond Viladrosa, Darvoy, FR;
Ahmed Khacef, Orleans, FR;
Eric Robert, Orleans, FR;
Sébastien Dozias, Orleans, FR;
Centre National de la Recherche Scientifique (CNRS), Paris, FR;
Universite D'Orleans, Orleans, FR;
Abstract
A new device based on very short pulsed discharges, generating plasmas balls and plumes over very long distances (up to several meters). These plasma balls travel in a dielectric guide at the end of which there is generation of an apparent plasma plume like zone, with a shape and intensity dependent on the discharge repetition rate. A secondary mixture plasma can be produced close to a given surface by adding other gas fluxes in the main gas stream. The plasma balls can be generated in gases at a repetition rate in the range from single shot to multi-kilohertz.