The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2013
Filed:
Feb. 11, 2009
Applicants:
Haiwon Lee, Seoul, KR;
Meehye Jeong, Busan, KR;
Ashok D. Sagar, Seoul, KR;
Inventors:
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 12/30 (2006.01);
U.S. Cl.
CPC ...
Abstract
Disclosed is a copolymer suitable for use as a resist for atomic force microscope (AFM) lithography or e-beam lithography. The copolymer contains fluoroalkylsulfonium salts as photoacid generators. The copolymer has high solubility in organic solvents and high coating ability. In addition, the copolymer can be patterned with high sensitivity and resolution by lithography. Further disclosed is a method of preparation for the copolymer.
Quick Actions:
Lee, Haiwon. (2013). Resist copolymers containing photoacid generators for lithographic applications and its method of preparation (U.S. Patent No. 8481663). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8481663
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