The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 09, 2013

Filed:

Jan. 09, 2009
Applicants:

Yoko Matsuda, Ehime, JP;

Mie Takahashi, Ehime, JP;

Masahiro Aga, Ehime, JP;

Hideyuki Kurokawa, Ehime, JP;

Takahiko Tanida, Ehime, JP;

Ryosuke Yamada, Ehime, JP;

Inventors:

Yoko Matsuda, Ehime, JP;

Mie Takahashi, Ehime, JP;

Masahiro Aga, Ehime, JP;

Hideyuki Kurokawa, Ehime, JP;

Takahiko Tanida, Ehime, JP;

Ryosuke Yamada, Ehime, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/03 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed is a method for analyzing a sample solution, including introducing a sample solutionthrough a sample introduction partand developing the sample solutionto a developing layerthrough a capillary phenomenon to analyze an analyte contained in the sample solution, the sample introduction partbeing provided on one side of a test stripand the developing layerbeing provided on the other side of the test strip, wherein the test stripis disposed in such a development posture that the downstream region of the developing layer faces downward during the development. By this method, the developing rate is less susceptible to the viscosity of the sample solutionand thus has a small difference even among sample solutionsdiffering in viscosity. As a result, the analytical accuracy and reliability can be improved.


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