The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 09, 2013
Filed:
Feb. 23, 2011
Applicants:
Simin Feng, Ridgecrest, CA (US);
Mark B. Moran, Ridgecrest, CA (US);
M. Joseph Roberts, Ridgecrest, CA (US);
Linda F. Johnson, Ridgecrest, CA (US);
Inventors:
Simin Feng, Ridgecrest, CA (US);
Mark B. Moran, Ridgecrest, CA (US);
M. Joseph Roberts, Ridgecrest, CA (US);
Linda F. Johnson, Ridgecrest, CA (US);
Assignee:
The United States of America as Represented by the Secretary of the Navy, Washington, DC (US);
Primary Examiner:
Int. Cl.
CPC ...
B32B 15/04 (2006.01); B32B 33/00 (2006.01); G02B 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
An apparatus and method for imparting wide angle low reflection on any high reflective surfaces through resonant excitation of plasmonic leaky mode of a nanocavity.
Feng, Simin. (2013). Apparatus and method for imparting wide angle low reflection on conductive surfaces (U.S. Patent No. 8481153). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8481153
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile