The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 02, 2013

Filed:

Jun. 14, 2004
Applicants:

Wei Zhu, Stony Brook, NY (US);

Xuena Wang, Stony Brook, NY (US);

John S. Kovach, Setauket, NY (US);

Inventors:

Wei Zhu, Stony Brook, NY (US);

Xuena Wang, Stony Brook, NY (US);

John S. Kovach, Setauket, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 33/50 (2006.01);
U.S. Cl.
CPC ...
Abstract

A comprehensive analysis procedure for analyzing and comparing multiple sets of data to detect hidden discriminatory data patterns. The inventive procedure identifies a best subset of markers for optimal discrimination between two or more sets of data. A point-wise test on two or more sets of data is performed to calculate test statistic values and to generate a statgram, a two- or higher- dimensional map of the test statistic values along the range of data. A threshold is then determined for isolating critical regions of the statgram at each significance level to provide candidate markers. A subset of markers from the candidate markers is then selected to discriminate among the sets of data. The two or more sets of data are classified using the subset of markers.


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