The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2013
Filed:
Nov. 13, 2007
Sang-hun Lee, Suwon-si, KR;
Byoung-joo Kim, Anyang-si, KR;
Chul Huh, Suwon-si, KR;
Gwan-soo Kim, Seoul, KR;
Sang-Hun Lee, Suwon-si, KR;
Byoung-Joo Kim, Anyang-si, KR;
Chul Huh, Suwon-si, KR;
Gwan-Soo Kim, Seoul, KR;
Samsung Display Co., Ltd., Yongin, KR;
Abstract
A display device includes a first substrate including pixels and sensing electrodes corresponding with the pixels, and a second substrate facing the first substrate. The second substrate includes an organic layer with a black matrix dividing the pixels and a sensing spacer opposite to the sensing electrode. The organic layer including the black matrix and the sensing spacer may be formed in a single process using organic photoresist material. A mask includes a light-intercepting pattern including slits to block a portion of ultraviolet light emitted towards a photoresist layer to form the black matrix. The mask also includes a pattern to block ultraviolet light in a region corresponding to the sensing spacer if a negative type photoresist material is used, or the mask does not block ultraviolet light in the region corresponding to the sensing spacer if a positive type photoresist material is used.