The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2013
Filed:
Sep. 19, 2011
Method of manufacturing monolithic stationary phase and monolithic stationary phase produced thereby
Applicants:
Hsi-ya Huang, Zhongli, TW;
Yung-han Shih, Zhongli, TW;
Chao-hsiang Hsu, Zhongli, TW;
Wan-ling Liu, Zhongli, TW;
Singco Brenda, Zhongli, TW;
Inventors:
Hsi-Ya Huang, Zhongli, TW;
Yung-Han Shih, Zhongli, TW;
Chao-Hsiang Hsu, Zhongli, TW;
Wan-Ling Liu, Zhongli, TW;
Singco Brenda, Zhongli, TW;
Assignee:
Chung Yuan Christian University, Zhongli, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F 20/22 (2006.01); C08F 2/46 (2006.01); B29D 11/00 (2006.01); H05B 6/68 (2006.01); C08J 3/28 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present invention relates to a method of manufacturing a polymer-based monolithic stationary phase in an ionic liquid reaction medium via microwave-assisted vinylization and polymerization. The invention is time-effective and environmental friendly for not using volatile organic compounds.