The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 02, 2013

Filed:

Oct. 30, 2008
Applicants:

Jieguang Wang, Beijing, CN;

Aizeng MA, Beijing, CN;

Jianqiang Ren, Beijing, CN;

Changqing Ji, Beijing, CN;

Xinkuan Zhang, Beijing, CN;

Hengfang Chen, Beijing, CN;

Yajun Zhao, Beijing, CN;

Inventors:

Jieguang Wang, Beijing, CN;

Aizeng Ma, Beijing, CN;

Jianqiang Ren, Beijing, CN;

Changqing Ji, Beijing, CN;

Xinkuan Zhang, Beijing, CN;

Hengfang Chen, Beijing, CN;

Yajun Zhao, Beijing, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C10G 9/16 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention relates to a pre-passivation process for a continuous reforming apparatus prior to the reaction, or a passivation process for a continuous reforming apparatus during the initial reaction, comprising loading a reforming catalyst into the continuous reforming apparatus, starting the gas circulation and raising the temperature of a reactor, injecting sulfide into the gas at a reactor temperature ranging from 100-650° C., controlling the sulfur amount in the recycle gas within a range of 0.5-100×10L/L so as to passivate the apparatus.


Find Patent Forward Citations

Loading…