The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2013
Filed:
May. 03, 2006
Sharma Pamarthy, Hayward, CA (US);
Huutri Dao, San Jose, CA (US);
Xiaoping Zhou, San Jose, CA (US);
Kelly A. Mcdonough, San Jose, CA (US);
Jivko Dinev, Cupertino, CA (US);
Farid Abooameri, San Ramon, CA (US);
David E. Gutierrez, San Jose, CA (US);
Jim Zhongyi He, Sunnyvale, CA (US);
Robert S. Clark, San Jose, CA (US);
Dennis M. Koosau, Hayward, CA (US);
Jeffrey William Dietz, San Jose, CA (US);
Declan Scanlan, Sunnyvale, CA (US);
Subhash Deshmukh, San Jose, CA (US);
John P. Holland, San Jose, CA (US);
Alexander Paterson, San Jose, CA (US);
Sharma Pamarthy, Hayward, CA (US);
Huutri Dao, San Jose, CA (US);
Xiaoping Zhou, San Jose, CA (US);
Kelly A. McDonough, San Jose, CA (US);
Jivko Dinev, Cupertino, CA (US);
Farid Abooameri, San Ramon, CA (US);
David E. Gutierrez, San Jose, CA (US);
Jim Zhongyi He, Sunnyvale, CA (US);
Robert S. Clark, San Jose, CA (US);
Dennis M. Koosau, Hayward, CA (US);
Jeffrey William Dietz, San Jose, CA (US);
Declan Scanlan, Sunnyvale, CA (US);
Subhash Deshmukh, San Jose, CA (US);
John P. Holland, San Jose, CA (US);
Alexander Paterson, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Embodiments of the invention provide a method and apparatus, such as a processing chamber, suitable for etching high aspect ratio features. Other embodiments include a showerhead assembly for use in the processing chamber. In one embodiment, a processing chamber includes a chamber body having a showerhead assembly and substrate support disposed therein. The showerhead assembly includes at least two fluidly isolated plenums, a region transmissive to an optical metrology signal, and a plurality of gas passages formed through the showerhead assembly fluidly coupling the plenums to the interior volume of the chamber body.