The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8475551 B1

PDF
Full Text
Expired
Date of Patent:
Jul. 02, 2013

Filed:

May. 07, 2007
Applicants:

Andreas Tsangaris, Ottawa, CA;

Kenneth Craig Campbell, Ontario, CA;

Mao Pei Cui, Ottawa, CA;

Geoffrey Dobbs, Ontario, CA;

Douglas Michael Feasby, Alberta, CA;

Zhiyuan Shen, Ottawa, CA;

Inventors:

Andreas Tsangaris, Ottawa, CA;

Kenneth Craig Campbell, Ontario, CA;

Mao Pei Cui, Ottawa, CA;

Geoffrey Dobbs, Ontario, CA;

Douglas Michael Feasby, Alberta, CA;

Zhiyuan Shen, Ottawa, CA;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B 3/36 (2006.01); C01B 6/24 (2006.01); C01B 3/02 (2006.01); C10J 3/16 (2006.01); C10J 3/00 (2006.01); B01J 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method and apparatus is described for reformulating of an input gas from a gasification reaction into a reformulated gas. More specifically, a gas reformulating system having a gas reformulating chamber, one or more plasma torches, one or more oxygen source(s) inputs and control system is provided thereby allowing for the conversion of an input gas from a gasification reaction into a gas of desired composition.


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