The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2013
Filed:
Aug. 07, 2008
Satoru Watanabe, Kawasaki, JP;
Yasuhide Matsumoto, Kawasaki, JP;
Masashi Uyama, Kawasaki, JP;
Masatomo Yasaki, Kawasaki, JP;
Youji Kohda, Kawasaki, JP;
Mitsuru Oda, Kawasaki, JP;
Hiroki Ichiki, Kawasaki, JP;
Madoka Mitsuoka, Kawasaki, JP;
Satoru Watanabe, Kawasaki, JP;
Yasuhide Matsumoto, Kawasaki, JP;
Masashi Uyama, Kawasaki, JP;
Masatomo Yasaki, Kawasaki, JP;
Youji Kohda, Kawasaki, JP;
Mitsuru Oda, Kawasaki, JP;
Hiroki Ichiki, Kawasaki, JP;
Madoka Mitsuoka, Kawasaki, JP;
Fujitsu Limited, Kawasaki, JP;
Abstract
A model creation support system includes a model managing part that acquires and accumulates an identifier of a model, data indicating a phenomenon, data indicating a regression equation, and evaluation data from an information processing apparatus that predicts or analyzes the phenomenon, using a model represented by the regression equation, a factor value extracting part that generates and records factor value data indicating the degree to which the factor contributes to the model from the accumulated data, and a model proposing part that refers to the factor value data based on a request for supporting model creation and model condition data received from the information processing apparatus, thereby generating and outputting support data containing a factor capable of contributing to the model to the information processing apparatus. Thus, information on factors of the model can be accumulated and utilized for enhancement of the fitting degree of the model.