The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2013
Filed:
Oct. 12, 2007
Yoshinori Nakajima, Osaka, JP;
Toshihiro Tamura, Osaka, JP;
Yoshinori Nakajima, Osaka, JP;
Toshihiro Tamura, Osaka, JP;
Sharp Kabushiki Kaisha, Osaka, JP;
Abstract
A substrate reworking system () improves rework tact time and eliminates unnecessary reworking to perform efficient reworking. The system () includes: a defect information acquisition unit () for acquiring defect information for an entire region on the target substrate (); a reworking unit () having at least one liquid drop discharge unit () for dispensing a liquid drop to a defective part on the target substrate () based on the defect information acquired by the defect information acquisition unit (); and a rework determining unit () for determining, for each target substrate () and based on the defect information acquired by the defect information acquisition unit (), whether the reworking unit () needs to perform reworking.