The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 8471319 B1

PDF
Full Text
Expired
Date of Patent:
Jun. 25, 2013

Filed:

Sep. 20, 2011
Applicants:

Kazuhiro Matsuo, Mie, JP;

Masayuki Tanaka, Kanagawa, JP;

Hirofumi Iikawa, Mie, JP;

Inventors:

Kazuhiro Matsuo, Mie, JP;

Masayuki Tanaka, Kanagawa, JP;

Hirofumi Iikawa, Mie, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 29/792 (2006.01); H01L 21/28 (2006.01);
U.S. Cl.
CPC ...
Abstract

A semiconductor device is disclosed. The semiconductor device includes a semiconductor substrate; a gate insulating film formed above the semiconductor substrate; a charge storage layer formed above the gate insulating film; a multilayered interelectrode insulating film formed in a first region above an upper surface portion of the element isolation insulating film, a second region above a sidewall portion of the charge storage layer and a third region above an upper surface portion of the charge storage layer, the interelectrode insulating film including a stack of an upper silicon oxide film, a middle silicon nitride film, and a lower silicon oxide film; a control gate electrode formed above the interelectrode insulating film; wherein the middle silicon nitride film is thinner in the third region than in the second region and the upper silicon oxide film is thicker in the third region than in the second region.


Find Patent Forward Citations

Matsuo, Kazuhiro. (2013). Semiconductor device having multilayered interelectrode insulating film (U.S. Patent No. 8471319). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8471319

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