The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 25, 2013

Filed:

Feb. 05, 2009
Applicants:

Antonio Facchetti, Chicago, IL (US);

Zhihua Chen, Skokie, IL (US);

He Yan, Skokie, IL (US);

Yan Zheng, Skokie, IL (US);

Jordan Quinn, Skokie, IL (US);

Marcel Kastler, Basel, CH;

Florian Doetz, Singapore, SG;

Silke Koehler, Basel, CH;

Inventors:

Antonio Facchetti, Chicago, IL (US);

Zhihua Chen, Skokie, IL (US);

He Yan, Skokie, IL (US);

Yan Zheng, Skokie, IL (US);

Jordan Quinn, Skokie, IL (US);

Marcel Kastler, Basel, CH;

Florian Doetz, Singapore, SG;

Silke Koehler, Basel, CH;

Assignees:

BASF SE, Ludwigshafen, DE;

Polyera Corporation, Skokie, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 73/06 (2006.01); C08G 73/10 (2006.01); C08G 65/34 (2006.01); C08G 75/06 (2006.01); C08G 75/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed are new semiconductor materials prepared from naphthalene-imide copolymers. Such polymers can exhibit desirable electronic properties and can possess processing advantages including solution-processability and/or good stability at ambient conditions.


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