The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2013
Filed:
Jun. 01, 2009
Arimichi Okumura, Himeji, JP;
Keizo Inoue, Himeji, JP;
Kazuki Okamoto, Himeji, JP;
Daicel Chemical Industries, Ltd., Osaka-Shi, JP;
Abstract
A polymer for lithographic purposes has at least a repeating structural unit represented by following General Formula (I). In Formula (I), R, R, R, and Reach independently represent hydrogen atom, a halogen atom, cyano group, an alkyl group, or a haloalkyl group; Rand Reach independently represent hydrogen atom, cyano group, etc.; Xand Xeach independently represent single bond, or a substituted or unsubstituted bivalent alkylene, alkenylene, or cycloalkylene group, etc.; Xand Xeach independently represent single bond or —CO—; R, R, R, and Reach independently represent hydrogen atom, an alkyl group, or a cycloalkyl group. The polymer for lithographic purposes shows good balance between line edge roughness (LER) and etching resistance and allows very fine and uniform patterning.