The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2013
Filed:
Nov. 24, 2010
Applicants:
Yingjian Chen, Fremont, CA (US);
Shiwen Huang, Fremont, CA (US);
Fenglin Liu, Milpitas, CA (US);
Kyusik Shin, Pleasanton, CA (US);
Inventors:
Yingjian Chen, Fremont, CA (US);
Shiwen Huang, Fremont, CA (US);
Fenglin Liu, Milpitas, CA (US);
Kyusik Shin, Pleasanton, CA (US);
Assignee:
HGST Netherlands B.V., Amsterdam, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01);
U.S. Cl.
CPC ...
Abstract
A perpendicular write head having a wrap around shield and a conformal side gap. In fabricating the write head, the leading edge shield may be chemical mechanical polished down to a level that is substantially even with a chemical mechanical polishing stop layer. Because the leading edge shield and the chemical mechanical polishing stop layer are used as RIE stop for trench RIE, a fully conformal side shield may be formed with a LTE/LES.