The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2013
Filed:
May. 29, 2009
Tetsuya Mino, Hong Kong, CN;
Naoto Matono, Hong Kong, CN;
Ikuhito Onodera, Hong Kong, CN;
Kazushi Nishiyama, Hong Kong, CN;
Michitoshi Tsuchiya, Hong Kong, CN;
Kenji Sasaki, Hong Kong, CN;
Tetsuya Mino, Hong Kong, CN;
Naoto Matono, Hong Kong, CN;
Ikuhito Onodera, Hong Kong, CN;
Kazushi Nishiyama, Hong Kong, CN;
Michitoshi Tsuchiya, Hong Kong, CN;
Kenji Sasaki, Hong Kong, CN;
SAE Magnetics (H.K.) Ltd., Hong Kong, CN;
Abstract
A method of manufacturing a perpendicular magnetic write head capable of precisely narrowing a side gap is provided. A tip portion having a cross sectional geometry of an inverted trapezoid is formed in an opening portion of a non-magnetic layer and thereafter, the non-magnetic layer is etched with the tip portion as a mask. Thereby, a portion adjacent to the tip portion in a writing track width direction remains and an outermost edge portion of the tip portion in that direction is located on a plane which coincides with an etching face (side face) of the non-magnetic layer. When a gap layer is formed with a vapor phase growth such as a sputtering method to cover the side face of the non-magnetic layer and thereafter a side shield layer is formed adjacently to the tip portion therethrough, a thickness of the gap layer becomes extremely thin and is reproduced precisely. Therefore, the side gap is narrowed with high precision.