The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 25, 2013

Filed:

Nov. 23, 2004
Applicants:

Christoph Charton, Furth im Wald, DE;

Matthias Fahland, Dresden, DE;

Mario Krug, Neustadt/Sachsen, DE;

Nicolas Schiller, Stolpen OT Helmsdorf, DE;

Steffen Straach, Dresden, DE;

Inventors:

Christoph Charton, Furth im Wald, DE;

Matthias Fahland, Dresden, DE;

Mario Krug, Neustadt/Sachsen, DE;

Nicolas Schiller, Stolpen OT Helmsdorf, DE;

Steffen Straach, Dresden, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/35 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention relates to a method for producing an ultrabarrier layer system through vacuum coating a substrate with a layer stack that is embodied as an alternating layer system of smoothing layers and transparent ceramic layers, but comprising at least one smoothing layer between two transparent ceramic layers, which are applied by sputtering, in which during the deposition of the smoothing layer a monomer is admitted into an evacuated coating chamber in which a magnetron plasma is operated.


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