The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 25, 2013
Filed:
Jul. 16, 2009
Eric Tixhon, Crisnee, BE;
Joseph Leclercq, Evere, BE;
Eric Michel, Uckange, FR;
AGC Glass Europe, Brussels, BE;
Abstract
A process for surface preparation of a substrate (), which comprises introducing or running a substrate () into a reaction chamber (). A dielectric barrier () is placed between electrodes (). A high-frequency electrical voltage is generated, to generate filamentary plasma (). Molecules () are introduced into the reaction chamber (). Upon contact with the plasma, they generate active species typical of reacting with the surface of the substrate. An adjustable inductor (L) placed in parallel with the inductor of the installation is employed to reduce the phase shift between the voltage and the current generated and to increase the time during which the current flows in the plasma ().
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile